GRAPHENE PRODUCTION UTILIZING SILICON WAFERS

Commercial graphene production utilizes silicon wafers as a base substrate. This technique grows a high-quality graphene (single-crystal) on silicon wafers, which is then appropriate for use in transistors with ultra-low power consumption. The lower power increases processing clock speeds by two fold and reduces heat leading to a higher gigahertz spec, potentially up to 100.

The graphene, once peeled off from the silicon wafer, can be used on flexible smartphones and watches as well as computers that are wearable. The best part is that the silicon wafer can be reused eliminating the need for other substrates such as copper, that have to be wastefully “burnt away” with chemicals.

MANUFACTURING PROCESS

Starting with a standard silicon wafer, Step 1 involves coating the wafer in a layer of germanium (Ge), and then gently dipping the wafer into a solution of hydrofluoric (HF) acid stripping off the germanium oxide and leaving a multitude of hydrogen atoms, which bond to the germanium (see figure 1).

Step 2 involves a chemical vapor deposition (CVD) process that deposits the graphene layer on top of what is now an H-terminanted germanium. Step 3; the wafer is baked and cooled under vacuum to prepare it for the graphene to be peeled off of the silicon wafer. The graphene monolayer crystals give the peeled layer a crease-free high quality sheet to be placed on your substrate.

The graphene sheets switching capability at low voltages (less than 0.5volts) has the potential to solve one of the greatest challenges in electronics. Tunnel transistors, enabling supply voltage scaling, would be able to filter through the energy barrier instead of jumping through.

For more information about Graphene on Silicon Wafers, Silicon Wafers, and SOI Wafers, call or email Applied Watts today! We are the leaders in providing products and helpful information to ensure your application will succeed.