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![N-TYPE PREFERRED IN OPTICS](https://static.wixstatic.com/media/6027da_05c18caf79e943e3a8aacdcb1c7a0b4f~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_05c18caf79e943e3a8aacdcb1c7a0b4f~mv2.webp)
N-TYPE PREFERRED IN OPTICS
N-TYPE AND P-TYPE IN OPTICS N-type and p-type starting material (Si feedstock), have the same type of silicon crystals. However, the...
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![DEEP REACTIVE ION ETCHING - PREFERRED METHOD](https://static.wixstatic.com/media/6027da_7c065f5d508844c9ac5146795b921435~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_7c065f5d508844c9ac5146795b921435~mv2.webp)
DEEP REACTIVE ION ETCHING - PREFERRED METHOD
When through silicon via (TSV) sizes are 10µm Ø and 500µm deep for example, the surface specifications play a crucial role in deciding...
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![REDUCING COST OF GALLIUM ARSENIDE DEVICES](https://static.wixstatic.com/media/6027da_57970722d11f4edf950b8676659c38d5~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_57970722d11f4edf950b8676659c38d5~mv2.webp)
REDUCING COST OF GALLIUM ARSENIDE DEVICES
We love silicon for its low cost solutions; however there is another material that can revolutionize how we think of computer chips,...
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![GRAPHENE PRODUCTION UTILIZING SILICON WAFERS](https://static.wixstatic.com/media/6027da_30146f5d8b8c43a0b5229fb973755164~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_30146f5d8b8c43a0b5229fb973755164~mv2.webp)
GRAPHENE PRODUCTION UTILIZING SILICON WAFERS
Commercial graphene production utilizes silicon wafers as a base substrate. This technique grows a high-quality graphene...
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![Succeeding - Silicon Wafer and SOI Wafer Temperature Uniformity Processing](https://static.wixstatic.com/media/6027da_da0b430687f24cf3b39a513ac257c3ab~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_da0b430687f24cf3b39a513ac257c3ab~mv2.webp)
Succeeding - Silicon Wafer and SOI Wafer Temperature Uniformity Processing
SUCCEEDING in acceptable silicon wafer and soi wafer temperature uniformity during rapid thermal processing (RTP), continues to...
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![SOI Wafers - The Importance of The BOX](https://static.wixstatic.com/media/6027da_7a87ee1360ad410f9857046951d58583~mv2.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_7a87ee1360ad410f9857046951d58583~mv2.webp)
SOI Wafers - The Importance of The BOX
The electrical isolation is provided on the BOX (buried oxide) layer between the substrate and the top Silicon (SI) layer, as well as...
![SOI Wafers - Used in Neural Probes Applied Watts -](https://static.wixstatic.com/media/6027da_29799bcc9a23460089b75e10bf70ddbe~mv1.png/v1/fill/w_319,h_240,fp_0.50_0.50,q_95,enc_auto/6027da_29799bcc9a23460089b75e10bf70ddbe~mv1.webp)
SOI Wafers - Used in Neural Probes Applied Watts -
Readily available 25-µm thick, Standard Device Layer, Silicon On Insulator (SOI) wafers are used for neural probes, with a 1-µm buried...
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![Deep Etching Silicon Wafers](https://static.wixstatic.com/media/6027da_c3a41b1772594071b35a46b92827ff4a~mv1.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_c3a41b1772594071b35a46b92827ff4a~mv1.webp)
Deep Etching Silicon Wafers
Plasma materials processing have become more important as materials and chemistries have increased in difficulty with process...
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![Patterned Silicon Wafers Improved with Quartz Gas-Line Heat](https://static.wixstatic.com/media/6027da_3a5648447ce549e4a151f9ec758da131.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_3a5648447ce549e4a151f9ec758da131.webp)
Patterned Silicon Wafers Improved with Quartz Gas-Line Heat
Baking out a chamber with the existing heater is designed to remove surface contaminants that are adsorbed to the material. However...
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![Silicon On Insulator (SOI) Wafers Innovate](https://static.wixstatic.com/media/6027da_f0c74150bd934cd6b9a47b71a020fe18.jpg/v1/fill/w_319,h_240,fp_0.50_0.50,q_90,enc_auto/6027da_f0c74150bd934cd6b9a47b71a020fe18.webp)
Silicon On Insulator (SOI) Wafers Innovate
SOI Wafer Layers With the mobile revolution in full swing, pressure is mounting on smart phone and device manufacturers. SOI wafers have...