Advanced Lithography Services - Applied Watts
Applied Watts Advanced Lithography Services
• I-line & DUV resist spin coatings
✓ Materials either provided by customer or from Applied Watts stock
✓ BARC
✓ TARC
✓ Thickness contour maps available
• Outsource your ASML “Zero” layer to Applied Watts
✓ Start material with patterned and etched “zero” layers
✓ Etch depth SPC controlled to 1200A ±200A
✓ Prealignment & fine alignment characterization of all wafers, with batch statistics, available
• Applied Watts as your lithography cell backup and short term capacity add partner
✓ Lithography cell qualified to customer specifications
✓ Matched to customer WIP
✓ Regular lithography cell monitoring provides risk free switching
• Calibrated wafer grid definition and target placement optimization
✓ Patterned, etched, alignment targets (for any system) placement to an accuracy of <15nm
✓ _Alignment targets (for any system) on both sides of the wafer, with an overlay accuracy of <300nm (front to back)
• Lens distortion and Focal Plane metrology
✓ Characterize and monitor your lens X,Y distortion
✓ Characterize and monitor your lens Focal Plane
• Pilot production runs: Lab to Fab
✓ Build your product using a foundry lithography system, it’s scalable, ready for production
✓ Outsource your critical layers to reduce your costs
• Research and Development
✓ Explore your next technology node using AW’s lithography cell
✓ Develop your first prototype devices
This document contains proprietary information of APPLIED WATTS –CA, USA and is tendered subject to the conditions that the information (a) be retained in confidence, (b) not be reproduced or copied in whole or in part and ( c) not be used or incorporated in any product, except under an express written agreement with Applied Watts , www.appliedwatts.com
